Principles of Vapor Deposition of Thin Films

Author: Harsha   Professor K. S. K. S Sree  

Publisher: Elsevier Science‎

Publication year: 2005

E-ISBN: 9780080480312

P-ISBN(Paperback): 9780080446998

P-ISBN(Hardback):  9780080446998

Subject: TB3 Engineering Materials

Language: ENG

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Description

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.

Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.

* Offers detailed derivation of important formulae.
* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.
* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Chapter

Front Cover

pp.:  1 – 4

Copyright

pp.:  5 – 6

Contents

pp.:  6 – 13

Acknolowdgements

pp.:  13 – 14

Chapter 01 INTRODUCTION

pp.:  14 – 24

Chapter 02 EVAPORATION

pp.:  24 – 158

Chapter 03 PLASMA STATE

pp.:  158 – 272

Chapter 04 COLD PLASMA DISCHARGES

pp.:  272 – 380

Chapter 05 THERMAL EVAPORATION SOURCES

pp.:  380 – 466

Chapter 06 GAS FLOW IN THIN FILM PROCESSING SYSTEMS

pp.:  466 – 548

Chapter 07 SPECIAL SOURCES

pp.:  548 – 632

Chapter 08 GAS SOLID INTERACTIONS

pp.:  632 – 698

Chapter 09 NUCLEATION AND GROWTH OF FILMS

pp.:  698 – 844

Chapter 10 EPITAXY

pp.:  844 – 924

Chapter 11 SUBSTRATE PREPARATION

pp.:  924 – 974

Chapter 12 STRUCTURE AND PROPERTIES OF FILMS

pp.:  974 – 1086

Chapter 13 DRY ETCHING

pp.:  1086 – 1148

Index

pp.:  1148 – 1174

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