LOW TEMPERATURE PREPARATION OF (Bi,Nd) 4 TI 3 O 12 THIN FILMS BY LIQUID-DELIVERY MOCVD USING NEODYMIUM PRECURSORS WITH HIGH DEPOSITION EFFICIENCY

Author: TASAKI Y.   SEKITA Y.   TANAKA T.   YODA K.   NITTAMACHI T.   YOSHIZAWA S.  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.81, Iss.1, 2006-11, pp. : 271-279

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