High Quality of Ultra-Thin SiO_xN_y Films Prepared in Nitrous Oxide Ambients Using Thermal Low-Pressure Oxynitridation

Author： Liu GuoZhu Hong GenShen Zheng RuoCheng Wu XiaoDong Yang WenJun

ISSN： 1042-6914

Source： Materials and Manufacturing Processes, Vol.29, Iss.9, 2014-09, pp. : 1050-1055

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