Special features of the growth of hydrogenated amorphous silicon in PECVD reactors

Author： Gorbachev Yu.   Zatevakhin M.   Krzhizhanovskaya V.   Shveigert V.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7842

Source： Technical Physics, Vol.45, Iss.8, 2000-08, pp. : 1032-1041

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