Author: Chandrashekaraiah Thejaswini Halethimmanahally Bogdanowicz Robert Rühl Eckart Danilov Vladimir Meichsner Jürgen Thierbach Steffen Hippler Rainer
Publisher: MDPI
E-ISSN: 1996-1944|9|7|594-594
ISSN: 1996-1944
Source: Materials, Vol.9, Iss.7, 2016-07, pp. : 594-594
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Bišćan M. Kregar Z. Krstulović N. Milošević S.
Plasma Chemistry and Plasma Processing, Vol. 30, Iss. 3, 2010-06 ,pp. :
By Fan Hong-Yu Shi Chuan Li Xiao-Song Yang Xue-Feng Xu Yong Zhu Ai-Min
Plasma Chemistry and Plasma Processing, Vol. 29, Iss. 1, 2009-02 ,pp. :
By Morent Rino Geyter Nathalie Vlierberghe Sandra Vanderleyden Els Dubruel Peter Leys Christophe Schacht Etienne
Plasma Chemistry and Plasma Processing, Vol. 29, Iss. 2, 2009-04 ,pp. :
By Mizushima Takanori Matsumoto Kazumi Ohkita Hironobu Kakuta Noriyoshi
Plasma Chemistry and Plasma Processing, Vol. 27, Iss. 1, 2007-02 ,pp. :