Amorphous hydrogenated carbon nitride films deposited via an expanding thermal plasma at high growth rates

Author： de Graaf A.   Dinescu G.   Longueville J.L.   van de Sanden M.C.M.   Schram D.C.   Dekempeneer E.H.A.   van Ijzendoorn L.J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.333, Iss.1, 1998-11, pp. : 29-34

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