Transmission electron microscopy study of simultaneous high-dose C + +N + co-implantation into (111)Si

Author: Morales F.M.   Molina S.I.   Ponce A.   Araujo D.   Garca R.   Barbadillo L.   Cervera M.   Piqueras J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.426, Iss.1, 2003-02, pp. : 16-30

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Abstract