Nitrogen as background gas in pulsed-laser deposition growth of indium tin oxide films at room temperature

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Thin Solid Films, Vol. 429, Iss. 1, 2003-04 ,pp. : 220-224

Elsevier

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Low-resistivity indium tantalum oxide films by magnetron sputtering

By Ju H.   Hwang S.   Jeong C.-O.   Park S.-H.   Choi J.-G.   Park C.  

Applied Physics A, Vol. 79, Iss. 1, 2004-06 ,pp. : 109-111

Springer Publishing Company

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Effect of laser irradiation on the properties of indium tin oxide films deposited at room temperature by pulsed laser deposition

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Vacuum, Vol. 67, Iss. 2, 2002-09 ,pp. : 209-216

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Influence of tin doping on the structural and physical properties of indium-zinc oxides thin films deposited by pulsed laser deposition

By Naghavi N.   Marcel C.   Dupont L.   Guery C.   Maugy C.   Tarascon J.M.  

Thin Solid Films, Vol. 419, Iss. 1, 2002-11 ,pp. : 160-165

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Highly conducting transparent indium tin oxide films prepared by pulsed laser deposition

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