CFD Simulation of Chemical Vapor Deposition of Silicon Carbide in CH3SiCl3-H2 System

Publisher： Bentham Science Publishers

E-ISSN： 1875-6786|10|1|135-137

ISSN： 1573-4137

Source： Current Nanoscience, Vol.10, Iss.1, 2014-02, pp. : 135-137

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