Thermal activation and temperature dependent PL and CL of Tb doped amorphous AlN and SiN thin films

Publisher: John Wiley & Sons Inc

E-ISSN: 1610-1642|12|8|1183-1186

ISSN: 1862-6351

Source: PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol.12, Iss.8, 2015-08, pp. : 1183-1186

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Abstract