Publisher: IOP Publishing
E-ISSN: 1742-6596|671|1|196-200
ISSN: 1742-6596
Source: Journal of Physics: Conference Series , Vol.671, Iss.1, 2016-01, pp. : 196-200
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Particle Simulation of Electrostatic Waves Driven by an Electron Beam
By Jun Guo
Chinese Physics Letters, Vol. 27, Iss. 2, 2010-02 ,pp. :
Electron-beam lithography simulation for EUV mask applications
Journal of Physics: Conference Series , Vol. 10, Iss. 1, 2005-01 ,pp. :