PULSED LASER IRRADIATION OF NICKEL THIN FILMS ON SILICON

Publisher： Edp Sciences

E-ISSN： 0449-1947|44|C5|C5-449-C5-454

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.44, Iss.C5, 1983-10, pp. : C5-449-C5-454

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Characteristics of phase transitions in inhomogeneous silicon monoxide/chromium thin films exposed to pulsed laser irradiation

By Shepelyavyi P.   Kunets V.   Mikhailovskaya E.   Indutnyi I.  

Technical Physics Letters, Vol. 25, Iss. 2, 1999-02 ,pp. : 131-133

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

FUNDAMENTALS OF PULSED LASER IRRADIATION OF SILICON

By  

Le Journal de Physique Colloques, Vol. 44, Iss. C5, 1983-10 ,pp. : C5-23-C5-36

Edp Sciences

Access to resources Recommend Favorite

THE INFLUENCE OF THE SUBSTRATE ON THE TEMPERATURE GRADIENTS INDUCED BY PULSED LASER IRRADIATION OF THIN AMORPHOUS CrNi AND Cr FILMS

By  

Le Journal de Physique IV, Vol. 01, Iss. C7, 1991-12 ,pp. : C7-140-C7-140

Edp Sciences

Access to resources Recommend Favorite

Large area pulsed laser deposited ferroelectric thin films of epitaxial Bi-layered perovskites on silicon

By  

Le Journal de Physique IV, Vol. 08, Iss. PR9, 1998-12 ,pp. : Pr9-251-Pr9-254

Edp Sciences

Access to resources Recommend Favorite

Molecular dynamic simulations of surface morphology and pulsed laser deposition growth of lithium niobate thin films on silicon substrate

By Yue Liu   Hao-Nan Zhu   Zi-Dong Pei   Yong-Fa Kong   Jing-Jun Xu  

Chinese Physics B, Vol. 24, Iss. 5, 2015-05 ,pp. : 56802-56805

IOP Publishing

Access to resources Recommend Favorite