Exoelectron emission studies of trap spectrum in ultrathin amorphous Si 3 N 4 films

Author: Naich M.   Rosenman G.   Roizin Y.   Molotskii M.  

Publisher: Elsevier

ISSN: 0038-1101

Source: Solid-State Electronics, Vol.48, Iss.3, 2004-03, pp. : 477-482

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next