Improved characterization of polycrystalline silicon film, by resonant Raman scattering

Author： Paillard V. Puech P. Temple-Boyer P. Caussat B. Scheid E. Couderc J.P. de Mauduit B.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.337, Iss.1, 1999-01, pp. : 93-97

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