PECVD of amorphous TiO 2 thin films: effect of growth temperature and plasma gas composition

Author： Battiston G.A.   Gerbasi R.   Gregori A.   Porchia M.   Cattarin S.   Rizzi G.A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.371, Iss.1, 2000-08, pp. : 126-131

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