Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias

Author： Tristant P.   Ding Z.   Trang Vinh Q.B.   Hidalgo H.   Jauberteau J.L.   Desmaison J.   Dong C.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.390, Iss.1, 2001-06, pp. : 51-58

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