Mo/Si multilayers for EUV lithography by ion beam sputter deposition

Author： Chasse T. Neumann H. Ocker B. Scherer M. Frank W. Frost F. Hirsch D. Schindler A. Wagner G. Lorenz M. Otto G. Zeuner M. Rauschenbach B.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.71, Iss.3, 2003-05, pp. : 407-415

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