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By Schumacher M.   Lindner J.   Baumann P.K.   Schienle F.   Solayappan N.   Joshi V.   Araujo C.A.   McMillan L.D.   in Materials Science in Semiconductor Processing

ISSN:1369-8001|5|2|85-91

Elsevier‎(2002)‎

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