By Sheehan J P   Longmier B W   Bering E A   Olsen C S   Squire J P   Ballenger M G   Carter M D   Cassady L D   Díaz F R Chang   Glover T W   Ilin A V   in Plasma Sources Science and Technology

ISSN:0963-0252|23|4|45014-45020

IOP Publishing‎(2014)‎

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