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Elsevier‎(2002)‎

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By Hody V.   Belmonte T.   Pintassilgo C.   Poncin-Epaillard F.   Czerwiec T.   Henrion G.   Segui Y.   Loureiro J.   in Plasma Chemistry and Plasma Processing

ISSN:0272-4324|26|3|251-266

Springer Publishing Company ‎(2006)‎

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