By Astakhov D I   Goedheer W J   Lee C J   Ivanov V V   Krivtsun V M   Zotovich A I   Zyryanov S M   Lopaev D V   Bijkerk F   in Plasma Sources Science and Technology

ISSN:0963-0252|24|5|55018-55027

IOP Publishing‎(2015)‎

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