A complementary-metal-oxide-semiconductor-field-effect-transistor-compatible atomic force microscopy tip fabrication process and integrated atomic force microscopy cantilevers fabricated with this process

Author： Ono M.   Lange D.   Brand O.   Hagleitner C.   Baltes H.  

Publisher： Elsevier

ISSN： 0304-3991

Source： Ultramicroscopy, Vol.91, Iss.1, 2002-05, pp. : 9-20

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