Formation of (Bi,La) 4 Ti 3 O 12 Films on Si(100) Substrates Using LaAlO 3 Buffer Layers

Author： Park Byung-Eun  

Publisher： Taylor & Francis Ltd

ISSN： 0015-0193

Source： Ferroelectrics, Vol.293, Iss.1, 2003-01, pp. : 145-152

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