Etching Characteristics of (Na0.5K0.5)NbO3 Thin Films in an Inductively Coupled Cl2/Ar Plasma

Author： Kang Chan Min   Kim Gwan-Ha   Kim Kyoung-Tae   Kim Chang-Il  

Publisher： Taylor & Francis Ltd

ISSN： 0015-0193

Source： Ferroelectrics, Vol.357, Iss.1, 2007-01, pp. : 179-184

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