Author： Cheng Weiming Hu Hao Dai Yifan Cheng Xiaomin Miao Xiangshui
Publisher： Taylor & Francis Ltd
ISSN： 1042-6914
Source： Materials and Manufacturing Processes, Vol.28, Iss.5, 2013-05, pp. : 505-508
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Abstract
SmCo5 film is an emerging candidate for the recording material of future high density magnetic recording because of its huge uniaxial magneto-crystalline anisotropy. In this article, SmCo5 films were fabricated by radio frequency (RF) magnetron sputtering system onto quartz glass substrate, and a Cu underlayer was proposed in order to improve magnetic properties of SmCo5 films. The dependences of sputtering power, thickness and annealing temperature on the magnetic properties of SmCo5/Cu films were studied. Using the optimal sputtering parameters of sputtering power of 60 w, thickness of 65 nm, and annealing temperature of 650°C, the coercivity of SmCo5/Cu films is improved significantly.
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