EFFECTS OF THERMAL DIFFUSION AND SUBSTRATE TEMPERATURE ON SILICON DEPOSITION IN AN IMPINGING-JET CVD REACTOR

Author: Leakeas C. L.   Sharif M. A. R.  

Publisher: Taylor & Francis Ltd

ISSN: 1521-0634

Source: Numerical Heat Transfer Part A: Applications, Vol.44, Iss.2, 2003-08, pp. : 127-147

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Abstract