The Factors Affecting the Particle Distributions Inside the Silane PCVD Reactor for Semiconductor Processing

Author: Kim Dong-Joo   Kim Kyo-Seon  

Publisher: Taylor & Francis Ltd

ISSN: 1521-7388

Source: Aerosol Science and Technology, Vol.32, Iss.4, 2000-04, pp. : 293-308

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