Author： Ono S. Nishimura Y. Teii S.
Publisher： Science and Technology Network Inc.
ISSN： 1203-8407
Source： Journal of Advanced Oxidation Technologies, Vol.4, Iss.3, 1999-08, pp. : 343-346
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Titov V. Rybkin V. Smirnov S. Kulentsan A. Choi H.-S.
Plasma Chemistry and Plasma Processing, Vol. 26, Iss. 6, 2006-12 ,pp. :
Access to resources
Recommend
