Extreme Ultraviolet Interferometric Lithography: A Path to Nanopatterning

Author: Cerrina F.   Isoyan A.   Jiang F.   Cheng Y. C.   Leonard Q.   Wallace J.   Heinrich K.   Ho A.   Efremov M.   Nealey P.  

Publisher: Taylor & Francis Ltd

ISSN: 0894-0886

Source: Synchrotron Radiation News, Vol.21, Iss.4, 2008-07, pp. : 12-24

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Abstract