Response to Comments by M. Kosmulski on “The Electroviscous Behavior of Dispersions of Amorphous Silica (Ludox) in KCl Solutions” by J. Laven and H. N. Stein

Author： Laven J.   Stein H.N.  

Publisher： Academic Press

ISSN： 0021-9797

Source： Journal of Colloid and Interface Science, Vol.242, Iss.1, 2001-10, pp. : 278-278

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