The Chemical Physics of Solid Surfaces and Heterogeneous Catalysis

Author: King   D. A.  

Publisher: Elsevier Science‎

Publication year: 2012

E-ISBN: 9780444601308

P-ISBN(Paperback): 9780444427823

P-ISBN(Hardback):  9780444427823

Subject: O647.11 interfacial chemistry (surface chemistry)

Language: ENG

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Description

Surface Properties of Electronic Materials is the fifth volume of the series, The Chemical Physics of Solid Surfaces and Heterogeneous Catalysis. This volume indicates the present state of some basic properties of semiconductor surfaces.
Chapter one summarizes the general problems in electronic materials and the areas affected by the surface science methods. The next two chapters illustrate the existing perception of the electronic and structural properties of elemental and compound semiconductor surfaces. This volume also deals with the properties of adsorption of semiconductors relating to both relevant gas phase species and metals. Chapters four to six of this volume explore compound semiconductors and elemental semiconductors.
The remaining chapters of this volume explore the adsorption of metals on elemental semiconductors; aspects of growth kinetics and dynamics involved in molecular beam epitaxy; molecular beam epitaxy of silicon; insulators; and metastable phases. The last chapter covers the surface chemistry of dry etching processes.

Chapter

Front Cover

pp.:  1 – 4

Copyright Page

pp.:  5 – 10

Preface

pp.:  8 – 16

Table of Contents

pp.:  10 – 8

Chapter 2. Structural and electronic properties of elemental semiconductors and surfaces

pp.:  52 – 84

Chapter 3. Atomic geometry and electronic structure of tetrahedrally coordinated compound semiconductor interfaces

pp.:  84 – 134

Chapter 4. Adsorption and Schottky barrier formation on compound semiconductor surfaces

pp.:  134 – 198

Chapter 5. Adsorption on elemental semiconductors

pp.:  198 – 250

Chapter 6. Adsorption and reaction of metals on elemental semiconductors

pp.:  250 – 286

Chapter 7. Molecular beam epitaxy of III-V compounds. Aspects of growth kinetics and dynamics

pp.:  286 – 324

Chapter 8. Molecular beam epitaxy of silicon and related materials

pp.:  324 – 384

Chapter 9. Molecular beam epitaxy of insulators, metastable phases and II–VI compounds

pp.:  384 – 442

Chapter 10. Surface chemistry of dry etching processes

pp.:  442 – 480

Index

pp.:  480 – 490

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