Ion Implantation Technology - 94

Author: Coffa   S.;Ferla   G.;Rimini   E.  

Publisher: Elsevier Science‎

Publication year: 1995

E-ISBN: 9780444599728

P-ISBN(Paperback): 9780444821942

P-ISBN(Hardback):  9780444821942

Subject: O43 Optics

Language: ENG

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Description

The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.

The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.

Chapter

Fornt Cover

pp.:  1 – 4

Copyright Page

pp.:  5 – 8

Editorial

pp.:  6 – 7

Table of Contents

pp.:  8 – 6

PART I

pp.:  20 – 460

PART II

pp.:  460 – 1026

Author Index

pp.:  1026 – 1032

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