Dry Etching for Microelectronics ( Volume 4 )

Publication series :Volume 4

Author: Powell   R. A.  

Publisher: Elsevier Science‎

Publication year: 2012

E-ISBN: 9780080983585

P-ISBN(Paperback): 9780444869050

P-ISBN(Hardback):  9780444869050

Subject:

Language: ENG

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Description

This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters.

Chapter

Front Cover

pp.:  1 – 4

Copyright Page

pp.:  5 – 12

Introduction to the series

pp.:  6 – 7

Preface to Volume 4

pp.:  8 – 11

Advisory board

pp.:  11 – 12

Contents

pp.:  12 – 14

Table of Contents

pp.:  12 – 6

Chapter 2. Plasma etching of refractory metals and metal silicides

pp.:  52 – 92

Chapter 3. Dry etching of Group Ill–Group V compound semiconductors

pp.:  92 – 126

Chapter 4. Reactive ion beam etching

pp.:  126 – 228

Chapter 5. Dry etching for microelectronics–A bibliography

pp.:  228 – 308

Subject index

pp.:  308 – 313

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