Hydrogen in Semiconductors :Hydrogen in Silicon ( Volume 34 )

Publication subTitle :Hydrogen in Silicon

Publication series :Volume 34

Author: Pankove   Jacques I.;Johnson   Noble M.  

Publisher: Elsevier Science‎

Publication year: 1991

E-ISBN: 9780080864310

P-ISBN(Paperback): 9780127521343

P-ISBN(Hardback):  9780127521343

Subject: TN304 material

Language: ENG

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Description

Hydrogen plays an important role in silicon technology, having a profound effect on a wide range of properties. Thus, the study of hydrogen in semiconductors has received much attention from an interdisciplinary assortment of researchers. This sixteen-chapter volume provides a comprehensive review of the field, including a discussion of hydrogenation methods, the use of hydrogen to passivate defects, the use of hydrogen to neutralize deep levels, shallow acceptors and shallow donors in silicon, vibrational spectroscopy, and hydrogen-induced defects in silicon. In addition to this detailed coverage of hydrogen in silicon, chapters are provided that discuss hydrogen-related phenomena in germanium and the neutralization of defects and dopants in III*b1V semiconductors.

Provides the most in-depth coverage of hydrogen in silicon available in a single source**Includes an extensive chapter on the neutralization of defects in III*b1V semiconductors**Combines both experimental and theoretical studies to form a comprehensive reference

Chapter

Front Cover

pp.:  1 – 4

Hydrogen in Semiconductors

pp.:  4 – 5

Copyright Page

pp.:  5 – 6

Contents

pp.:  6 – 12

List of Contributors

pp.:  12 – 14

Preface

pp.:  14 – 16

Chapter 3. Hydrogenation of Defects in Crystalline Silicon

pp.:  50 – 64

Chapter 4. Hydrogen Passivation of Damage Centers in Semiconductors

pp.:  64 – 80

Chapter 5. Neutralization of Deep Levels in Silicon

pp.:  80 – 106

Chapter 6. Neutralization of Shallow Acceptors in Silicon

pp.:  106 – 128

Chapter 7. Neutralization of Donor Dopants and Formation of Hydrogen-Induced Defects in n-Type Silicon

pp.:  128 – 154

Chapter 8. Vibrational Spectroscopy of Hydrogen-Related Defects in Silicon

pp.:  154 – 200

Chapter 9. Hydrogen in Semiconductors: Ion Beam Techniques

pp.:  200 – 240

Chapter 10. Hydrogen Migration and Solubility in Silicon

pp.:  240 – 366

Chapter 11. Hydrogen-Related Phenomena in Crystalline Germanium

pp.:  366 – 396

Chapter 12. Hydrogen Diffusion in Amorphous Silicon

pp.:  396 – 462

Chapter 13. Neutralization of Defects and Dopants in III-V Semiconductors

pp.:  462 – 526

Chapter 14. Computational Studies of Hydrogen-Containing Complexes in Semiconductors

pp.:  526 – 562

Chapter 15. Muonium in Semiconductors

pp.:  562 – 600

Chapter 16. Theory of Isolated Interstitial Hydrogen and Muonium in Crystalline Semiconductors

pp.:  600 – 638

Index

pp.:  638 – 646

Contents of Previous Volumes

pp.:  646 – 656