Materials Fundamentals of Molecular Beam Epitaxy

Author: Tsao   Jeffrey Y.  

Publisher: Elsevier Science‎

Publication year: 2012

E-ISBN: 9780080571355

P-ISBN(Paperback): 9780127016252

P-ISBN(Hardback):  9780127016252

Subject: O78 crystal growth

Language: ENG

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Description

The technology of crystal growth has advanced enormously during the past two decades. Among, these advances, the development and refinement of molecular beam epitaxy (MBE) has been among the msot important. Crystals grown by MBE are more precisely controlled than those grown by any other method, and today they form the basis for the most advanced device structures in solid-state physics, electronics, and optoelectronics. As an example, Figure 0.1 shows a vertical-cavity surface emitting laser structure grown by MBE.

* Provides comprehensive treatment of the basic materials and surface science principles that apply to molecular beam epitaxy
* Thorough enough to benefit molecular beam epitaxy researchers
* Broad enough to benefit materials, surface, and device researchers
* Referenes articles at the forefront of modern research as well as those of historical interest

Chapter

Front Cover

pp.:  1 – 4

Copyright Page

pp.:  5 – 8

Dedication

pp.:  6 – 12

Table of Contents

pp.:  8 – 6

Preface

pp.:  12 – 18

List of Figures

pp.:  18 – 22

List of Tables

pp.:  22 – 24

Part I: Bulk Phase Equilibria

pp.:  24 – 114

Part II: Thin Film Structure and Microstructure

pp.:  114 – 222

Part III: Surface Morphology and Composition

pp.:  222 – 310

Index

pp.:  310 – 325

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