Advances in Atomic, Molecular, and Optical Physics ：Fundamentals of Plasma Chemistry ( Volume 43 )

Publication subTitle ：Fundamentals of Plasma Chemistry

Publication series ：Volume 43

Author： Inokuti   Mitio  

Publisher： Elsevier Science‎

Publication year： 1999

E-ISBN: 9780080561547

P-ISBN(Paperback): 9780120038435

P-ISBN(Hardback):  9780120038435

Subject： O65 Analytical Chemistry

Language： ENG

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Description

This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics.
Articles are written by distinguished experts who are active in their research fields. The articles contain both relevant review material as well as detailed descriptions of important recent developments.

Chapter

Front Cover

pp.：  1 – 4

Advances in Atomic, Molecular, and Optical Physics, Volume 43

pp.：  4 – 5

Copyright Page

pp.：  5 – 6

Contents

pp.：  6 – 10

Contributors

pp.：  10 – 12

Chapter 1. Plasma Processing of Materials and Atomic, Molecular, and Optical Physics. An Introduction

pp.：  12 – 30

Chapter 2. The Boltzmann Equation and Transport Coefficients of Electrons in Weakly Ionized Plasmas

pp.：  30 – 90

Chapter 3. Electron Collision Data for Plasma Chemistry Modeling

pp.：  90 – 122

Chapter 4. Electron-Molecule Collisions in Low-Temperature Plasmas: The Role of Theory

pp.：  122 – 158

Chapter 5. Electron Impact Ionization of Organic Silicon Compounds

pp.：  158 – 198

Chapter 6. Kinetic Energy Dependence of Ion–Molecule Reactions Related to Plasma Chemistry

pp.：  198 – 242

Chapter 7. Physicochemical Aspects of Atomic and Molecular Processes in Reactive Plasmas

pp.：  242 – 254

Chapter 8. Ion–Molecule Reactions

pp.：  254 – 306

Chapter 9. Uses of High-Sensitivity White-Light Absorption Spectroscopy in Chemical Vapor Deposition and Plasma Processing

pp.：  306 – 352

Chapter 10. Fundamental Processes of Plasma–Surface Interactions

pp.：  352 – 384

Chapter 11. Recent Applications of Gaseous Discharges: Dusty Plasmas and Upward-Directed Lightning

pp.：  384 – 412

Chapter 12. Opportunities and Challenges for Atomic, Molecular, and Optical Physics in Plasma Chemistry

pp.：  412 – 420

Index

pp.：  420 – 428

Contents of Volumes in This Serial

pp.：  428 – 440

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