In Situ Microlithography of Si and GaAs by a Focused Ion Beam in a 200 keV TEM

Author： Furuya Kazuo   Saito Tetsuya   Yamada Isamu   Hata Takao  

Publisher： Oxford University Press

ISSN： 0022-0744

Source： Journal of Electron Microscopy, Vol.45, Iss.4, 1996-08, pp. : 291-297

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