In Situ Analysis of Fluorinated Gases in Plasma Etching by Infrared Spectroscopy

Author: Poll H. U.   Hinze D.   Schlemm H.  

Publisher: Society for Applied Spectroscopy

ISSN: 0003-7028

Source: Applied Spectroscopy, Vol.36, Iss.4, 1982-07, pp. : 445-451

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content