Tandem Helium Plasma Spectrometry with a Capacitively Coupled Discharge Formed Above a Helium ICP

Author： Chan Shi-Kit Tan Hsiaoming Montaser Akbar

Publisher： Society for Applied Spectroscopy

ISSN： 0003-7028

Source： Applied Spectroscopy, Vol.43, Iss.1, 1989-01, pp. : 92-95

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