Study of a Chemically Amplified Resist for X-ray Lithography by Fourier Transform Infrared Spectroscopy

Author: Tan T.L.   Wong D.   Lee P.   Rawat R.S.   Patran A.  

Publisher: Society for Applied Spectroscopy

ISSN: 0003-7028

Source: Applied Spectroscopy, Vol.58, Iss.11, 2004-11, pp. : 1288-1294

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content