Potential of Far-Ultraviolet Absorption Spectroscopy as a Highly Sensitive Analysis Method for Aqueous Solutions. Part II: Monitoring the Quality of Semiconductor Wafer Cleaning Solutions Using Attenuated Total Reflection

Author: Higashi Noboru   Ikehata Akifumi   Kariyama Naomi   Ozaki Yukihiro  

Publisher: Society for Applied Spectroscopy

ISSN: 0003-7028

Source: Applied Spectroscopy, Vol.62, Iss.9, 2008-09, pp. : 1022-1027

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