Simulation of material and processing effects on photoresist line-edge roughness

Author： Patsis G.P.   Nijkerk M.D.   Leunissen L.H.A.   Gogolides E.  

Publisher： Inderscience Publishers

ISSN： 1742-7185

Source： International Journal of Computational Science and Engineering, Vol.2, Iss.3-4, 2007-03, pp. : 134-143

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