Identification of influence factors in a thermal model of a plasma-assisted chemical vapor deposition process

By Rouquette Sébastien   Autrique Laurent   Chaussavoine Charles   Thomas Laurent  

Inverse Problems in Science and Engineering, Vol. 15, Iss. 5, 2007-01 ,pp. : 489-515

Taylor & Francis Ltd

Access to resources Recommend Favorite

PLASMA ASSISTED DEPOSITION OF INTEGRATED OPTIC WAVEGUIDES

By Gawne D. T.   Nourshargh N.   Kandasamy I.   Starr E. M.  

Surface Engineering, Vol. 6, Iss. 2, 1990-01 ,pp. : 107-112

Maney Publishing

Access to resources Recommend Favorite

Hydrogen embrittlement of titanium during microwave plasma assisted CVD diamond deposition

By Fu Y.   Yan B.   Loh N.L.   Sun C.Q.   Hing P.  

Surface Engineering, Vol. 16, Iss. 4, 2000-08 ,pp. : 355-360

Maney Publishing

Access to resources Recommend Favorite

DIAGNOSTIC STUDIES OF DISCHARGES USED FOR PLASMA ASSISTED PHYSICAL VAPOUR DEPOSITION

By Davison A.   Avelar-Batista J. C.   Wilson A. D.   Leyland A.   Matthews A.   Fancey K. S.  

Surface Engineering, Vol. 18, Iss. 5, 2002-10 ,pp. : 385-390

Maney Publishing

Access to resources Recommend Favorite

Room Temperature Deposition of Silicon Nanodot Clusters by Plasma-Enhanced Chemical Vapor Deposition

By Kim Jae-Kwan   Kim Jun Young   Yoon Jae-Sik   Lee Ji-Myon  

Journal of Nanoscience and Nanotechnology, Vol. 13, Iss. 10, 2013-10 ,pp. : 7173-7176

American Scientific Publishers

Access to resources Recommend Favorite