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Journal of Electronic Materials, Vol. 26, Iss. 11, 1997-11 ,pp. : 1326-1330

Springer Publishing Company

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Electron cyclotron resonance plasma etching of materials for magneto-resistive random access memory applications

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Sustaining Mechanisms of the ECR Heating of Electrons in Low-Pressure Microwave Plasmas under Magnetic Multipole Confinement

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