Composition and Structure of Films Formed in Etching of Nickel in a Ni(NO₃)₂ Solution with NiCl₂ and NaNO₂ Additives

Author： Bachaev A. A. Kuzina T. E. Oshurina L. A.

ISSN： 1070-4272

Source： Russian Journal of Applied Chemistry, Vol.77, Iss.6, 2004-06, pp. : 934-937

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