Influence of CH4/H2 reactive ion etching on electrical and optical properties of AlGaAs/GaAs and pseudomorphic AlGaAs/InGaAs/GaAs heterostructures

Author: van Es C. M.   Eijkemans T. J.   Wolter J. H.   Pereira R.   Van Have M.   Van Rossum M.  

Publisher: Maney Publishing

ISSN: 1743-2847

Source: Materials Science and Technology, Vol.11, Iss.1, 1995-01, pp. : 41-45

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