Sharp boron doping within thin SiGe layer by rapid thermal chemical vapour deposition

Author: Tillack B.   Ritter G.   Krüger D.   Zaumseil P.   Morgenstern G.   Glowatzki K.-D.  

Publisher: Maney Publishing

ISSN: 1743-2847

Source: Materials Science and Technology, Vol.11, Iss.10, 1995-10, pp. : 1060-1064

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract