Preparation of Ultra Low-κ Porous SiOCH Films from Ring-Type Siloxane with Unsaturated Hydrocarbon Side Chains by Spin-On Deposition

Author： Chun-Xiao Yang Chi Zhang Qing-Qing Sun Sai-Sheng Xu Li-Feng Zhang Yu Shi Shi-Jin Ding Wei Zhang

Publisher： IOP Publishing

ISSN： 0256-307X

Source： Chinese Physics Letters, Vol.27, Iss.2, 2010-02, pp. : 27701-27703

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Interaction of F atoms with SiOCH ultra-low-k films: I. Fluorination and damage

By Rakhimova T V Lopaev D V Mankelevich Yu A Rakhimov A T Zyryanov S M Kurchikov K A Novikova N N Baklanov M R

Journal of Physics D: Applied Physics, Vol. 48, Iss. 17, 2015-05 ,pp. : 175203-175215

IOP Publishing

Access to resources Recommend Favorite

Interaction of F atoms with SiOCH ultra low-k films. Part II: etching

By Rakhimova T V Lopaev D V Mankelevich Yu A Kurchikov K A Zyryanov S M Palov A P Proshina O V Maslakov K I Baklanov M R

Journal of Physics D: Applied Physics, Vol. 48, Iss. 17, 2015-05 ,pp. : 175204-175217

IOP Publishing

Access to resources Recommend Favorite

Spikes in ring-type events from ultra relativistic nuclear collisions

By Ghosh D Deb A Lahiri M B Bhattacharya A

Canadian Journal of Physics, Vol. 86, Iss. 7, 2008-07 ,pp. : 919-922

NRC Research Press

Access to resources Recommend Favorite

Interaction of SF6 and O2 plasma with porous poly phenyl methyl silsesquioxane low-κ films

Journal of Physics D: Applied Physics, Vol. 48, Iss. 12, 2015-04 ,pp. : 125201-125209

IOP Publishing

Access to resources Recommend Favorite

Preparation and Properties of Ultra Low K Porous Silica Films Modified by Trimethylchlorosilane (TMCS)

By Fengguo Zhao Xiaoqing Wu Wei Ren Xiaofeng Chen Peng Shi Xi Yao

Ferroelectrics, Vol. 406, Iss. 1, 2010-01 ,pp. : 221-227

Taylor & Francis Ltd

Access to resources Recommend Favorite