Development and characterization of a secondary RF plasma-assisted closed-field dual magnetron sputtering system for optical coatings on large-area substrates

Author： Neumann M J   Raju R   Meng L   Flauta R   Shin H   Dockstader T A   Ruzic D N  

Publisher： IOP Publishing

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.19, Iss.2, 2010-04, pp. : 25011-25019

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