Author： Verreycken T van Gessel A F H Pageau A Bruggeman P
Publisher： IOP Publishing
ISSN： 0963-0252
Source： Plasma Sources Science and Technology, Vol.20, Iss.2, 2011-04, pp. : 24002-24007
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Xiong Qing Yang Zhiqiang Bruggeman Peter J
Journal of Physics D: Applied Physics, Vol. 48, Iss. 42, 2015-10 ,pp. :
Access to resources
Recommend
By Shirai Naoki Uchida Satoshi Tochikubo Fumiyoshi
Plasma Sources Science and Technology, Vol. 23, Iss. 5, 2014-10 ,pp. :
By Hontañón Esther Palomares Jose María Guo Xiaoai Engeln Richard Nirschl Hermann
Journal of Physics D: Applied Physics, Vol. 47, Iss. 41, 2014-10 ,pp. :
Access to resources